Author(s) Prof. Riikka Puurunen

Comments Invited tutorial given by Prof. Riikka Puurunen at the ALD for Industry event, Berlin, 19.3.2019. Video record taken with Panopto, (to be) shared in Youtube, you find the links e.g. through the blog post: https://blogs.aalto.fi/catprofopen/2019/03/19/prof-puurunen-invited-tutorial-at-ald-for-industry-berlin/ Title: ALD Technology – Introduction, History & Principles Abstract: This tutorial keynote will introduce atomic layer deposition (ALD) – a variant of chemical vapor deposition - and fundamental principles and concepts related it from a generic viewpoint applicable to any ALD process and reactor. The early history and current usage of ALD are briefly overviewed: who made the first experiments, when, and why? How has the view on the history of ALD evolved? Where is ALD now used, by whom, and why? ALD relies on repeated chemical adsorption steps from gas phase to surface. The status of understanding the adsorption steps of ALD films will be presented and discussed using mainly the archetype trimethylaluminium-water ALD process as example and 3D conformality modelling as additional vehicle. Plenty of links to further sources of information will be included in this keynote presentation.

Author(s) Kalle Niiranen

Comments In his presentation at the #ALD for Industry event, Kalle Niiranen showcases an example of industrial ALD moisture barrier coatings for printed circuit boards (PCB). The Beneq ALD solution is able to demonstrate significantly superior results against traditional methods, such as with parylene. Watch the presentation to learn more!

Author(s) Prof. Riika Puurunen

Comments ABSTRACT: Atomic layer deposition (ALD) has become of global importance as a processing technology for example in semiconductor device fabrication, and its application areas are continuously expanding. The significance of ALD was highlighted e.g. by the recent (2018) Millennium Technology Prize. Tens of companies are offering ALD tools, and thousands of people are involved in ALD R&D globally. A continuous need exists to educate new people on the fundamentals of ALD. While ALD for manufacturing may be regarded mature, as a scientific field, ALD—in the author’s view—is developing. For example, understanding of the early history of ALD is evolving, related to the two independent inventions of ALD under the names Atomic Layer Epitaxy in the 1970s and Molecular Layering in the 1960s [1-4]. Also, significantly varying views exist in the field related to the description and meaningfulness of even some core ALD concepts [5]. The purpose of this invited “ALD 101” tutorial is to familiarize a newcomer with fundamentals of ALD. The presentation largely follows the organization of a recent encyclopedia chapter on ALD [6]. Surface chemistry concepts will be introduced, such as ideal ALD from repeated, separate self-terminating (saturating and irreversible) reactions; growth per cycle in ALD; various monolayer concepts relevant to ALD; typical classes of surface reaction mechanisms and saturation-determining factors; growth modes; and ways to describe growth kinetics. Concepts, where differing views exist in the field and which thus need special attention, are pointed out. Typical deviations from the presented ideality are discussed.

Author(s) Prof. Riikka Puurunen.

Comments Virtual Project on the History of ALD in perspective: past, present, and final steps R. L. Puurunen,a Yu. Koshtyal,b J. Sundqvist,c J. R. van Ommen,d O. Yurkevich,e a Aalto University School of Chemical Engineering, Kemistintie 1, Espoo, Finland b Ioffe Institute, 26 Politekhnicheskaya, St Petersburg 194021, Russian Federation c Department of Physics, Chemistry and Biology (IFM), Linköping University, Sweden d TU Delft, Chemical Engineering, Van der Maasweg 9, Delft, The Netherlands e CIC nanoGUNE BRTA, Tolosa Hiribidea 76, Donostia-San Sebastián E-20018, Spain riikka.puurunen@aalto.fi

Author(s) Sami Sneck

Comments Advanced ALD VP, Sami Sneck, provides insights on the current state of ALD research for battery applications and introduces R2R ALD processing as a cutting-edge method for manufacturing functional interfaces on battery cell components.

Author(s) Prof. Riikka Puurunen

Comments Invited talks by Prof. Ruud van Ommen, Prof. Anatolii Malygin, Prof. Seán Barry;

Author(s) Sami Sneck, John Rönn

Comments Optical coatings have been traditionally deposited using Physical Vapor Deposition (PVD) techniques. As PVD techniques are line-of-sight deposition methods, it has always been challenging to apply optical coatings on non-planar substrates. State-of-the-art planetary rotation systems and other advanced means of moving the substrates help pushing the boundaries, but the inherent conformality limitation remains. Atomic Layer Deposition (ALD) offers a way to easily coat complex geometries with conformal and uniform optical coatings. This new method is making its way to the optical system designer’s toolbox, enabling use of new substrate formats such as tubes, highly curved lenses, domes, gratings, side walls etc. In this joint webinar with the OSA Thin Film Working Group, we explain how benefits of ALD can be utilized, and how the method can be made economical by using large batches or high deposition rate process. The webinar will cover several practical application examples utilizing the natural conformality of ALD in microscopic and macroscopic scale.

Author(s) Beneq

Comments This is a series of videos on the Beneq YouTube channel explaining the ALD technology.