Low‐Temperature ALD of SbOx/Sb2Te3 Multilayers with Boosted Thermoelectric Performance
Theoretical study on tin oxide surface chemistry mechanism and thermodynamic properties for atomic layer deposition equipment optimization
Unveiling the Potential of HfO2/WS2 Bilayer Films: Robust Analog Switching and Synaptic Emulation for Advanced Memory and Neuromorphic Computing
Defect-Mediated Atomic Layer Etching Processes on Cl–Si (100): An Atomistic Insight
Electron Microscopy and Electron Energy Loss Spectroscopy of Thin Titanium Nitride Films in the TiNx/La:HfO2(Hf0.5Zr0.5O2)/TiNx/SiO2 System
Surface Science for Improved Lithium Metal Batteries
Investigation of Electrochemical Stability of Ald Grown Li3PO4 Thin Films and Its Application in High‐Voltage PEO‐based All‐Solid‐State Lithium Batteries
[HTML] Optimizing Li Ion Transport in a Garnet-Type Solid Electrolyte via a Grain Boundary Design
H2O Promotion of CO Oxidation On Oxidized Pt/CeFeOx
Highly Porous Polymer Beads Coated with Nanometer-Thick Metal Oxide Films for Photocatalytic Oxidation of Bisphenol A
Comparative Study on Indium Precursors for Plasma-Enhanced Atomic Layer Deposition of In2O3 and Application to High-Performance Field-Effect Transistors.
[HTML] Improvement in the Stability of Cation (Si)/Anion (F or N) Codoped ZnO Thin-Film Transistors Formed via Atomic Layer Deposition
Comparative Study on Indium Precursors for Plasma-Enhanced Atomic Layer Deposition of In2O3 and Application to High-Performance Field-Effect Transistors
Plasma-Enhanced Atomic Layer-Deposited Ti,Si-Doped ZrO2 Antiferroelectric Films for Energy Storage Capacitors
Transfer Matrix Modeling Optical Properties of Short-Period Aluminum Oxide-Copper Multi-Layered Nanocomposites
Electrical Performance Determination and Stress Reliability Estimation of ALD-Derived ErO/InP Heterointerface
Enhancing electron interaction between Pt and support for superior electrochemical performance through atomic layer deposition of tungsten oxide
[HTML] Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times
Boosting the photocathode performances of protected Cu2O inverse opals using photonic-crystal heterostructures
[PDF] Main Aspects of Metallization Formation in Sub-10 nm Integrated Circuit Manufacturing Technology
PDF] Analysis of the Possibility of Independent Control of Various Plasma Parameters of an RF Non-Self-Sustained Plasma Discharge with Additional Ionization by …
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